15-16 Oct 2025 Toulouse (France)

Welcome

The 1st edition of EUROnanoLAB Thin Film experts group workshop on CVD and ALD is organised in Toulouse (France) by the LAAS-CNRS (https://www.laas.fr/en/) - member of the French network of academic cleanrooms RENATECH.

The objectives are to exchange information on the deposition technique used : equipment parameters, deposition process parameters, best practices, successful results, and shortcomings. Each expert will be able to request additional experience or assistance from ENL-TF.

• Interoperability of processes and equipment

• Cross-validation of physical and functional properties

• Shared access to specialized equipment 

• Joint training of engineers and technicians

 

There will also be discussions on: technological highlights, new equipment or equipment upgrades, and new thin-film materials.

The format of this workshop includes oral (15min) technical and technological presentations by CVD and/or ALD experts, equipment suppliers in the field, technical and technological presentations of CVD and/or ALD posters, round tables on CVD and ALD, and visits to the clean room of LAAS.

 The topics covered are :

  • Use of plasma for deposition : advantages/disadvantages
  • Surface treatment before deposition (ex situ ou in situ)
  • Annealling in situ or ex situ to obtain the crystalline phase
  • In situ diagnostics during the deposition
  • Characterizations of the properties of the deposited thin film for CVD or ALD

 

 Free registration to participate in the workshop with (or without) a presentation or a poster :



                                                          Registration for the workshop is now opened


                                                               Open from 20/05/2025 to 14/10/2025

 

EUROnanoLAB Thin Film expert group Workshop : thermal and plasma for CVD and ALD - Sciencesconf.org

 

Our laboratory access is restricted: please fill in the visit statement form

 

For questions or in case of problems, please contact (Organizing Committee) : 

Pascal Dubreuil dubreuil@laas.fr 

Susana Cardoso de Freitas scardoso@inesc-mn.pt 

Matias Trujillo ricardo.m.trujillo@ntnu.no

 

With the participation of :

  

Academic sponsors

 

 

Industrial sponsors

                 

October 15 (room EUROPE)

9:00  Shared Goal for thin film materials : Establish shared and duplicable standards  (P.Dubreuil – LAAS)

9:30  Development of CVD and ALD techniques @ CNR-ISMN Bologna (R.Rizzoli - CNR-ISMN)

10:00  In-situ monitoring PECVD processes (S.Calvez – LAAS)

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11:00  Overview of Thin Film Capabilities at NTNU NanoLab (M.Trujillo - NTNU)

11:30  Layered Insights : Combining PECVD and PVD for Controlled Thin Film Growth (S.Cardoso de Freitas – INESC MN)

12:00  Bridging the Ångström-Micron Gap, Advances in ICPECVD for Scalable High-Performance Films (P.Plate – Sentech)

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13:30  DLI-CVD & DLI-ALD : The most efficient technology for the deposition of new materials (V.Astié – Annealsys)

14:00  Bridging the Ångström-Micron Gap, Advances in ALD for Scalable High-Performance Films (P.Plate – Sentech)

14:30  An overview of our gas abatment solutions (F.Chapuis - Omicron Technologies)

15:00  Visit of the clean room (P.Dubreuil & L.Mazenq)

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16:00  Posters session (room VIGNEMALE) 

October 16 (Room EUROPE)

9:00    Synthesis of CVD&ALD presentations and posters (S.Cardoso de Freitas – Matias Trujillo)

9:30 - 10:30    CVD and ALD round table (P.Dubreuil – S.Cardoso de Freitas – Matias Trujillo)

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11:00 – 12:15 CVD and ALD assessment and prospective (P.Dubreuil – S.Cardoso de Freitas – Matias Trujillo)

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On line access : 

https://us02web.zoom.us/j/3180010001?pwd=ZXZSaU1Wbkw4YjloTVNNNFdtZVZRdz09
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