The objectives are to exchange information on the deposition technique used : equipment parameters, deposition process parameters, best practices, successful results, and shortcomings. Each expert will be able to request additional experience or assistance from ENL-TF.

There will also be discussions on: technological highlights, new equipment or equipment upgrades, and new thin-film materials.

The format of this workshop includes oral (15min) technical and technological presentations by CVD and/or ALD experts, equipment suppliers in the field, technical and technological presentations of CVD and/or ALD posters, round tables on CVD and ALD, and visits to the clean room of LAAS.

 The topics covered are :

• Use of plasma for deposition
• Surface treatment before deposition (ex situ ou in situ)
• Annealling in situ or ex situ to obtain the crystalline phase
• In situ diagnostics during the deposition
• Characterizations of the properties of the deposited thin film for CVD or ALD

 Free registration to participate in the workshop with (or without) a presentation or a poster :